Chemical Vapour Deposition of Diamond for Dental Tools and by Waqar Ahmed

By Waqar Ahmed

This quantity provides chemical vapour deposition of diamond movies for software in slicing instruments, microdrills, dental burs and surgical instruments. It examines a number of deposition concepts, discusses mechanisms of diamond development and their effect on slicing software existence and performance.

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Using Fluent: Mach number on the surfaces of the rotor was determined using CFD software. FLUENTTM needs the user to specify the flow as subsonic, or supersonic flow as input. Fluent does not require that specification before the calculation. The regime of the flow (subsonic, transonic, or supersonic) comes as part of the solution. The geometry of the rotor with three inlets, inclined at 45° with three inlets and a housing was created and the mesh was created. Volume elements considered for the mesh were approximately 600,000.

Several methods of pretreatment have been reported (XiLing and ZhaoPing 1994; Mitura 1987; Ashfold et al. 1994): • • • • Scratching the surface with small diamond or SiC µm sized particles. g. diamond). Chemical treatments such as acid etching Depositing hydrocarbon thin films on the substrate surface The basis for most of these methods is to produce scratches or irregularities in the substrate surface. These act as nucleation sites for diamond. Scratching with diamond results in particles being embedded into the surface and assists in the nucleation and subsequent growth of diamond crystallites.

4 Substrate Pre-treatments The characteristics of substrates required for diamond deposition were described in Chap. 1. A high density of crystallites is needed in the early growth stages to form a continuous film. This can be achieved by using a suitable substrate pretreatment. Silicon wafers used in the semiconductor industry are highly polished and therefore a pre-treatment is particularly important. Several methods of pretreatment have been reported (XiLing and ZhaoPing 1994; Mitura 1987; Ashfold et al.

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